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Deposition of Metal-Oxide Thin Films Thin film deposition of
SrTiO3 is currently a popular area of research due to its
widespread use in electronic applications and the motivation to shrink
electronic components. Pulsed laser deposition (PLD) is an effective
deposition process yielding dense, homogeneous thin films. Here,
classical molecular dynamics simulations are used to determine the
mechanisms involved in PLD. The simulations show that collisions that
occur between the incident particles and the substrate can induce
chemical reactions. The simulations consider the deposition of SrO and
TiO2 molecules with a kinetic energy between 0.1 and 1
eV/atom on a (001) surface of SrTiO3. The effects of impact
energy, orientation of incident particles, and surface termination
layer (SrO vs. TiO2) are examined. The main surface
phenomenon of interest is chemical changes that occur at the oxide
surface due to the ablating particles. We will also be investigating
the types of collisions that occur between different sized metal/oxide
clusters and the substrate. As plume materials in a PVD process travel
to the substrate, they react to lower their free energy. These
reactions often result in oxides, such as SrO and TiO2. They
can also result in metallic or oxide 'clusters' of several atoms. These
clusters, which can sometimes consist of around 20 atoms, form in
regular geometrical shapes. These shapes and the resulting properties
of the clusters can be quite different from bulk properties. For
example, Sr13 forms an icosohedral shape with five-fold
symmetry. Not much is known experimentally about the impact these
clusters have on thin film growth. We will model these clusters in our
simulations to try to determine these effects.
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Last Update:
Wednesday, April 27, 2005